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Qinhuangdao Intrinsic Crystal Technology Co., Ltd.

Ge Wafer Ge Window Germanium Windows Ge Lens, Optical Lens, Germanium Windows manufacturer / supplier in China, offering Ge Mono Wafer Ge Window Germanium Windows Ge Lens/Optical Lens, Precision Sapphire, Optical Windows, Calcium Fluoride (CaF2) Materials, Crystal Materials CaF2 Components and so on.

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Ge Mono Wafer Ge Window Germanium Windows Ge Lens/Optical Lens

FOB Price: US $20-60 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $20-60/ Piece
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Production Capacity: 5000
Payment Terms: T/T, Western Union

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Basic Info
  • Model NO.: D1"~D8"
  • Type: Flat Lens
  • Shape: Round
  • Lenses Color: Grey
  • Customized: Customized
  • HS Code: 9001909090
  • Usage: Optical
  • Transmittance: >95%
  • Material: Ge Mono
  • Certification: RoHS, SGS, ISO9001
  • Coating: Polish
Product Description
Ge Mono Wafer Ge Window Germanium Windows Ge Lens/Optical Lens
Single crystal (Ge)Germanium Wafer

 Ge wafer:

 

Germanium (Ge) is the preferred lens and window material for high performance infrared imaging systems in the 8-12 um wavelength band. Its high refractive index makes Ge ideal for low power imaging systems because of minimum surface curvature. Chromatic aberration is small, often eliminating the need for correction.
Germanium is most widely used for lenses and windows in IR systems operating in the 2 um - 12 um range. Its transmission is very temperature sensitive, becoming opaque near 100°C. Environment does not cause problems because Germanium is inert, mechanically rugged, and fairly hard.
Germanium is a high index material that is used to manufacture Attenuated Total reflection (ATR) prisms for spectroscopy. Its refractive index is such that germanium makes an effective natural 50% beamsplitter without the need for coatings. It is also used extensively as a substrate for production of optical filters. Germanium covers the whole of the 8-14 micron thermal band and is used in lens systems for thermal imaging. It can be AR coated with diamond producing an extremely tough front optic. 
Application as window, lens, beamsplitter, ATR prism or filter in spectrometers and in thermal imaging.
 

Specifications:

 Ge wafer:

 

Material:

 

Ge

Dimension Tolerance+0.0, -0.1mm
Thickness Tolerance:± 0.1mm
Surface quality:60/40
Clear Aperture:>85%
Flatness:λper 25mm
Parallelism:3' 
Bevel:<0.25mm X 45°
Coating:Upon requirement

General Properties of Germanium Wafer
 
General  Properties StructureCubic, a = 5.6754 Å 
Density: 5.765 g/cm3
Melting   Point: 937.4 oC 
Thermal Conductivity: 640
Crystal Growth TechnologyCzochralski 
Doping  availableUndopedSb DopingDoping In or Ga 
Conductive Type/   P
Resistivity, ohm.cm>35  < 0.05  0.05 - 0.1 
EPD < 5x103/cm < 5x103/cm2  < 5x103/cm2  
< 5x102/cm < 5x102/cm2 < 5x102/cm2  
  
 Grades and Application of Germanium wafer
Electronic GradeUsed for diodes and transistors,
Infrared or opitical GradeUsed for IR optical window or disks,opitical components
Cell GradeUsed for substrates of solar cell 
     
Standard Specs of  Germanium Crystal and wafer
     
Crystal Orientation<111>,<100> and <110> ± 0.5o or custom orientation
Crystal boule as grown1" ~ 6" diameter  x  200 mm Length
Standard blank as cut1"x 0.5mm2"x0.6mm4"x0.7mm5"&6"x0.8mm 
Standard Polished wafer(One/two sides polished)1"x 0.30 mm2"x0.5mm4"x0.5mm 5"&6"x0.6mm
Special size and orientation are available upon requested  Wafers
     
    
4 inch Ge wafer Specification    
DopingP   
Doping substances Ge-Ga   
Diameter 100±0.25 mm   
Orientation(100) 9° off toward <111>+/-0.5  
Off-orientation tilt angleN/A   
Primary Flat OrientationN/A   
Primary Flat Length32±1mm  
Secondary Flat Orientation N/A   
Secondary Flat LengthN/A mm  
cc(0.26-2.24)E18/c.c  
Resistivity(0.74-2.81)E-2ohm.cm  
Electron Mobility382-865cm2/v.s.  
EPD<300/cm2  
Laser MarkN/A   
Thickness175±10 μm  
TTV<15μm  
TIRN/Aμm  
BOW <10μm  
Warp<10μm  
Front face Polished   
Back face Ground   
 
Germanium Wafer Process
 
In the germanium wafer production process, germanium dioxide from the residue processing is further purified in chlorination and hydrolysis steps. 
1)High purity germanium is obtained during zone refining. 
 
2)A germanium crystal is produced via the Czochralski process. 
 
3)The germanium wafer is manufactured via several cutting, grinding, and etching steps. 
 
4)The wafers are cleaned and inspection. During this process, the wafers are single side polished or double side polished according to custom requirement, epi-ready wafercomes.
 
5)The wafers are packed in single wafer containers, under a nitrogen atmosphere.
 
 
Application:
Germanium blank or window are used in night vision and thermographic imaging solutions for commercial security, fire fighting and industrial monitoring equipment. Also, they are used as filters for analytical and measuring equipment, windows for remote temperature measurement, and mirrors for lasers.
Thin Germanium substrates are used in III-V triple-junction solar cells and for power Concentrated PV (CPV) systems.
Ge Mono Wafer Ge Window Germanium Windows Ge Lens/Optical Lens
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